PATTERN FORMATION MATERIAL, METHOD FOR PRODUCING POROUS STRUCTURE, METHOD FOR FORMING PATTERN, ELECTROCHEMICAL CELL, HOLLOW FIBER FILTER, METHOD FOR PRODUCING POROUS CARBON STRUCTURE, METHOD FOR PRODUCING CAPACITOR AND METHOD FOR PRODUCING CATALYTIC LAYER OF FUEL CELL

Japanese Patent JP3940546

B2

PROBLEM TO BE SOLVED: To obtain a material capable of being formed a pattern having a fair regularity in nanometer order and to provide a method therefor.
SOLUTION: This pattern formation material comprises a block copolymer or a graft copolymer, forms a micro phase separation structure and has ≥1.4 ratio of each N/(Nc-No) value (wherein, N is the total number of atoms in the monomer unit; Nc is the number of carbon atom in the monomer unit; and No is the number of oxygen atom in the monomer unit) of a monomer unit composing each polymer chain which is related to at least two kinds of polymer chains in plural polymer chains composing the block copolymer or the graft copolymer.

Toshiro Hiraoka
Asakawa Kouji
Yoshihiro Akasaka
Yasuyuki Hotta

JP2000169263A

July 04, 2007

June 06, 2000

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Toshiba Corporation

C08J9/26; G03F7/075; B82B1/00; B82B3/00; B82Y10/00; B82Y30/00; B82Y40/00; B82Y99/00; C01B31/02; C04B35/52; C08F297/02; C08F299/00; C08G81/02; C08G83/00; C23F1/00; G03F7/033; G11B5/65; G11B5/84; H01J9/02; H01L21/033; H01L21/302; H01L21/3065; H01M4/88; H01M4/96; H01M10/05; H01M50/406; H01M50/414; (IPC1-7): C08F297/02; C08F299/00; C08G81/02; C08G83/00; C08J9/26; H01L21/3065; H01M2/16; H01M4/88; H01M4/96; //C01B31/02; C04B35/52; H01M4/58; H01M10/40; C08L101:00

JP3292310A
JP11209558A
JP3119015A
JP3119014A
JP5310867A
JP10152540A
JP10259221A

Takehiko Suzue
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Shoji Kawai

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