Title:
PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP3676331
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a resist pattern having a good pattern shape when a resist pattern is formed using exposing light having a wavelength of ≤180 nm band with minimally producing scum.
SOLUTION: A pattern formation material comprising a base resin containing a unit represented by formula 1 and a unit represented by formula 2 and an acid generator is provided. In the formulae, R1 and R2 are the same or different and each H, Cl, F, alkyl or fluoroalkyl; R3 is a protecting group which is released by an acid; m is an integer of 0-5; and a and b satisfy 0<a<1, 0<b<1 and 0<a+b≤1.
Inventors:
Kishimura Shinji
Masataka Endo
Masako Sasako
Mitsuru Ueda
Takehiko Fujigaya
Masataka Endo
Masako Sasako
Mitsuru Ueda
Takehiko Fujigaya
Application Number:
JP2002250215A
Publication Date:
July 27, 2005
Filing Date:
August 29, 2002
Export Citation:
Assignee:
Matsushita Electric Industrial Co., Ltd
International Classes:
C08F8/00; C08F212/14; C08F228/02; C08F232/00; C08K5/00; C08L25/18; C08L41/00; C08L45/00; G03F7/00; G03F7/004; H01L21/027; G03F7/039; (IPC1-7): G03F7/039; C08F8/00; C08F212/14; C08F228/02; C08F232/00; C08K5/00; C08L25/18; C08L41/00; C08L45/00; H01L21/027
Domestic Patent References:
| JP2000330289A | ||||
| JP2003524211A | ||||
| JP2000330288A | ||||
| JP2001066780A |
Attorney, Agent or Firm:
Hiroshi Maeda
Hiroshi Koyama
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Teshima Masaru
Atsushi Fujita
Hiroshi Koyama
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Teshima Masaru
Atsushi Fujita