Title:
PATTERN FORMATION METHOD, SUBSTRATE MANUFACTURING METHOD, MANUFACTURING METHOD OF SOLAR CELL SUBSTRATE, AND SOLAR CELL SUBSTRATE
Document Type and Number:
Japanese Patent JP2013004665
Kind Code:
A
Abstract:
To provide a pattern formation method capable of reducing a manufacturing cost by reducing a number of steps.
A pattern formation method includes the steps of: forming a pattern by discharging an organic matter 2 onto a surface of a substrate 1 by an ink jet method; forming a thin film on the surface of the substrate 1 and the pattern at a temperature lower than a thermal decomposition temperature of the organic matter 2; and peeling the thin film formed on the organic matter by rupturing the thin film by heat-treating the substrate at a temperature higher than the thermal decomposition temperature of the organic matter.
Inventors:
HOSOKAWA YUICHIRO
Application Number:
JP2011133213A
Publication Date:
January 07, 2013
Filing Date:
June 15, 2011
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
H01L31/04
Attorney, Agent or Firm:
Hiroaki Sakai