パターン形成方法、及び、これらを用いる電子デバイスの製造方法

Title:

パターン形成方法、及び、これらを用いる電子デバイスの製造方法

Document Type and Number:

Japanese Patent JP5798964

Kind Code:

B2

Abstract:

There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive composition containing (A) a non-polymeric acid-decomposable compound having an aromatic ring and a molecular weight of 500 to 5,000 and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.

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Inventors:

Hidetomo Takahashi

Application Number:

JP2012072541A

Publication Date:

October 21, 2015

Filing Date:

March 27, 2012

Export Citation:

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Assignee:

FUJIFILM Corporation

International Classes:

G03F7/004; G03F7/038; G03F7/32

Domestic Patent References:

JP6102547A
JP5282938A
JP2011153087A
JP2009025707A
JP2013079230A
JP2012509494A
JP2011033840A
JP2013007785A
JP2010285376A
JP2007197389A
JP2009173623A

Foreign References:

WO2012036090A1

Other References:

Christine Y. Ouyang, Jin-Kyun Lee and Christopher K. Ober,Negative-tone development of photoresists in environmentally friendly silicone fluids,Proc. of SPIE,米国,SPIE,2012年 3月29日,8325,832524-1~832524-6
SPIE 2012 Advanced Lithography Technical Program,米国,SPIE,2012年 2月,32

Attorney, Agent or Firm:

Takeshi Takamatsu
Toshiyuki Ozawa
Hasegawa Hiromichi

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