Title:
PATTERN FORMING METHOD AND MOLD
Document Type and Number:
Japanese Patent JP2011140225
Kind Code:
A
Abstract:
To solve problems that in a nano-imprint method, accurate alignment between a substrate with an opening formed in the central part such as a disk substrate and a mold is difficult, and alignment accuracy is deteriorated by alignment mark damage caused by mechanical contact.
In the mold with the pattern formed by a fine uneven shape, alignment marks for determining the relative positional relationship between the substrate and the mold are attached in the shape of a concentric circle to at least two spots. From the positional information or the shape on/of each mark, a broken mark is identified and excluded, and the alignment between the mold and the substrate coated with a resin film is carried out.
Inventors:
OGINO MASAHIKO
MIYAUCHI AKIHIRO
ANDO TAKUJI
HAGINOYA CHISEKI
KOMORIYA SUSUMU
HAYATA YASUNARI
KATAGIRI SOUICHI
OTA HIROYA
NAKAYAMA YOSHINORI
MIYAUCHI AKIHIRO
ANDO TAKUJI
HAGINOYA CHISEKI
KOMORIYA SUSUMU
HAYATA YASUNARI
KATAGIRI SOUICHI
OTA HIROYA
NAKAYAMA YOSHINORI
Application Number:
JP2011017380A
Publication Date:
July 21, 2011
Filing Date:
January 31, 2011
Export Citation:
Assignee:
HITACHI LTD
International Classes:
B29C59/02; G11B5/84; H01L21/027
Domestic Patent References:
| JP2007523492A | 2007-08-16 | |||
| JP2005108975A | 2005-04-21 | |||
| JP2003086537A | 2003-03-20 | |||
| JP2000323461A | 2000-11-24 |
Attorney, Agent or Firm:
Manabu Inoue