Title:
PATTERN INSPECTION DEVICE, AND PATTERN INSPECTION METHOD
Document Type and Number:
Japanese Patent JP2021183942
Kind Code:
A
Abstract:
PURPOSE: To provide an inspection device that cam make even an inspected image acquired with a different beam near the inspected image acquired with the same condition.CONSTITUTION: An inspection device 100 of an embodiment of the present invention comprises: an image acquisition mechanism 150 that scans over a sample surface having patterns formed with a multiple primary electron beam, and detects a multiple secondary electron beam to be discharged from the sample surface to thereby acquire a corresponding secondary electron image for each primary electron beam; a storage device 109 that stores an individual correction kernel for aligning the corresponding secondary electron beam of each primary electron beam for a reference pattern with a reference blur image subjected to blurring processing; a correction circuit 113 that corrects the corresponding secondary electron image of each primary electron beam to be acquired from a sample intended for inspection, using the individual correction kernel; and a comparison circuit 108 that compares the inspected image to be composed of at least one part of the corrected secondary electron image with a reference image.SELECTED DRAWING: Figure 1
Inventors:
SHIRATO MASATAKA
NODA CHOSAKU
SUGIMORI TADAYUKI
NODA CHOSAKU
SUGIMORI TADAYUKI
Application Number:
JP2020089567A
Publication Date:
December 02, 2021
Filing Date:
May 22, 2020
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC
International Classes:
G01N23/2251
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Masahiro Takashita
Akira Sudo
Masahiro Takashita