パターン検査装置

Japanese Patent JP3661592

B2

In a pattern inspection device of the present invention having at least three electron-optical systems, detection signals approximately simultaneously obtained from identical circuit patterns are compared with each other. Further, areas around plural electron sources can be maintained at high degrees of vacuum by evacuating an electron gun chamber mounted with plural electron guns independently of a sample chamber. Further, electric fields and magnetic fields are confined in each electron-optical system by a shield electrode which makes it possible to evacuate an electron beam path to a high degree of vacuum, and at the same time, secondary electrons and reflected electrons are detected in the same electron-optical system by setting the samples to a negative voltage and accelerating secondary electrons and reflected electrons toward the electron source side in the direction of the electron beam axis. Thus, defect determination in pattern inspection is performable substantially simultaneously, and at the same time, the throughput of the inspections is improvable in proportion to the number of the electron-optical systems. Further, three or more electron sources are operable in a stable manner in high vacuum states, and signals from closely arranged electron-optical systems are detectable with high accuracy, and accurate inspections are performable.

Hisaya Murakoshi
Yusuke Yajima
Hiroyuki Shinada
Mari Nozoe
Atsuko Takafuji
Kaoru Umemura
Masaki Hasegawa
Katsuhiro Kuroda

JP2000541511A

June 15, 2005

March 27, 1998

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株式会社日立製作所

G01N23/225; G01Q30/02; G01Q30/04; G01Q30/20; H01J37/28; H01L21/66; (IPC1-7): G01N23/225; H01J37/07; H01J37/28; H01L21/66

JP63083605A
JP59006537A
JP50115469A
JP9219170A
JP6060841A
JP3187146A
JP3179242A
JP2142045A
JP2006705A

Yasuo Sakuta

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