Title:
Pattern inspection device
Document Type and Number:
Japanese Patent JP6085188
Kind Code:
B2
Abstract:
A pattern inspection apparatus has a first image acquisition part 301 which emits light from a first light source part 331 to a first main surface 91 of a film-like transparent base member 9 on which a pattern is formed and receives reflected light reflected on an upper surface of the pattern with a first light receiving part 341 to acquire an upper surface-reflected image; a second image acquisition part 302 which emits light from a second light source part 332 to a second main surface 92 of the transparent base member 9 and receives reflected light reflected on a lower surface of the pattern in contact with the first main surface 91 with a second light receiving part 342 to acquire a lower surface-reflected image; and an inspection part for obtaining an inspection result of the pattern on the basis of the upper surface-reflected image and the lower surface-reflected image. It is possible to easily inspect the widening and narrowing in lower portions of pattern elements by comparing the upper surface-reflected image based on the reflected light reflected on the upper surface of the pattern and the lower surface-reflected image based on the reflected light reflected on the lower surface of the pattern.
Inventors:
Shigeaki Fujiwara
Application Number:
JP2013028216A
Publication Date:
February 22, 2017
Filing Date:
February 15, 2013
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
G01N21/956; G01N21/892
Domestic Patent References:
| JP9222307A | ||||
| JP2001116700A | ||||
| JP2005140663A | ||||
| JP11281526A | ||||
| JP2001305074A | ||||
| JP2004212159A | ||||
| JP53102792A |
Foreign References:
| US5748320 |
Attorney, Agent or Firm:
Masahiro Matsusaka
Tsutomu Tanaka
Masamichi Ida
Tsutomu Tanaka
Masamichi Ida