PURPOSE: To provide a pattern transfer method in which heating of a mask can be suppressed to improve transfer precision.

CONSTITUTION: In a pattern transfer method which comprises arranging, in a specified area 61 of a mask 60, a beam transmitting part 64 for transmitting a charged particle beam and a beam limiting part 63 whose degree of scattering or absorption of a charged particle beam is larger than the beam transmitting part 64 according to a pattern PT1 to be transferred to a photosensitive base, and guiding at least a part of the charged particle beam transmitted by the mask 60 according to the emission of the charged particle beam to the specified area 61 to the photosensitive base to transfer the pattern PT1 to the photosensitive base, the emission per unit area of the charged particle beam to the beam limiting part 63 is set smaller than the emission per unit area of the charged particle beam to the beam transmitting part 64 when the charged particle beam is emitted to the specified area 61.