Title:
PATTERN TRANSFER METHOD USING ULTRAVIOLET CURABLE RESIN MATERIAL, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING SAME
Document Type and Number:
Japanese Patent JP2010264758
Kind Code:
A
Abstract:
To provide an ultraviolet curable resin material for a pattern transfer enabling a good pattern transfer considering that when only a monofunctional monomer is cured, curability of a film is bad, and that when a functionality is increased, the film is cured but curing shrinkage tends to be larger.
The used ultraviolet curable resin material 6 for the pattern transfer contains 80-95 wt.% of an isobornyl acrylate, 1-20 wt.% of a trifunctional acrylate, and 0.5-6 wt.% of a polymerization initiator.
COPYRIGHT: (C)2011,JPO&INPIT
Inventors:
UMEZAWA KAZUYO
MORITA SEIJI
SAKURAI MASATOSHI
MORITA SEIJI
SAKURAI MASATOSHI
Application Number:
JP2010135923A
Publication Date:
November 25, 2010
Filing Date:
June 15, 2010
Export Citation:
Assignee:
TOSHIBA CORP
International Classes:
B29C59/02; C08F220/18; H01L21/027; B29K33/04
Domestic Patent References:
| JP2008139535A | 2008-06-19 | |||
| JP2008116492A | 2008-05-22 | |||
| JPS61137240A | 1986-06-24 | |||
| JPH01105342A | 1989-04-21 | |||
| JPS6334108A | 1988-02-13 |
Attorney, Agent or Firm:
Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Katsumura Hiro
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Katsumura Hiro
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen