Title:
三次元光造形用のパターニング材料およびそれを用いた鋳造方法
Document Type and Number:
Japanese Patent JP7051336
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a patterning material for three-dimensional photo-molding.SOLUTION: A patterning material for three-dimensional photo-molding has a photocurable monomer, and a photoreactive initiator. The photocurable monomer has a polyfunctional, first photocurable monomer having a cyclic ether structure of at least 4-membered ring. In the patterning material, the content of the first photocurable monomer is 15 mass% or more, and a cured product of the patterning material has a glass transition point of 30°C or more.SELECTED DRAWING: Figure 1
Inventors:
Koji Watanabe
Hiroaki Ozoe
Hiroaki Ozoe
Application Number:
JP2017168688A
Publication Date:
April 11, 2022
Filing Date:
September 01, 2017
Export Citation:
Assignee:
Nagase Chemtex Co., Ltd.
International Classes:
B29C64/106; C08F2/46; B29C64/264; B33Y70/00; C08F20/20
Domestic Patent References:
| JP2013514213A | ||||
| JP2013514451A | ||||
| JP2010104285A | ||||
| JP2016097584A | ||||
| JP2007241168A | ||||
| JP2000084943A | ||||
| JP2004330743A | ||||
| JP2002067172A | ||||
| JP9234542A |
Foreign References:
| WO2015124557A1 |
Attorney, Agent or Firm:
Kawasaki/Hashimoto Patent Office
Shinichi Kawasaki
Shinichi Kawasaki