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Title:
PEELING SOLUTION OF PHOTOSENSITIVE COMPOSITION CONTAINING PHENOLIC RESIN
Document Type and Number:
Japanese Patent JPS60147736
Kind Code:
A
Abstract:

PURPOSE: To enable peeling at room temp. in a short time and to control environmental pollution by using a specified alcohol as an essential component for a peeling soln.

CONSTITUTION: An alcohol soln. of N(CH3)4OH and/or N(CH3)3(C2H4OH)OH is used as an essential component for the peeling soln. of a photosensitive compsn. contg. a phenolic resin. A base, for example, coated with the photosensitive compsn. soln. and exposed to UV rays, or further developed to form a pattern is immersed into such a peeling soln. to execute operations. The photosensitive compsn. contg. the phenolic resin, especially, subjected to stages of postbaking and UV reexposure, etc., can be well dissolved or the sizes of peeled pieces can be made small. Moreover, it can be peeled at room temp. in a short time with the soln. low in concn., resulting in lessening environmental pollution, and these peeling solns. can be used widely for the fields of photographic, printing, and electronic industries, etc.


Inventors:
KOIBUCHI SHIGERU
ISOBE ASAO
MAKINO DAISUKE
Application Number:
JP408384A
Publication Date:
August 03, 1985
Filing Date:
January 11, 1984
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03C11/00; G03F7/42; (IPC1-7): G03F7/00
Attorney, Agent or Firm:
Kunihiko Wakabayashi



 
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