Title:
PELLICLE FOR LITHOGRAPHY
Document Type and Number:
Japanese Patent JP2001264957
Kind Code:
A
Abstract:
To provide a pellicle for lithography with a high performance pellicle membrane using an amorphous perfoluroropolymer as the material of the membrane, excellent in peelability from a substrate in the formation of the membrane, free of photogradation and decomposition due to the absorption of short-wavelength ultraviolet light even when irradiated with the light for a long the time and having a long service life and a high invariable transmittance.
In the pellicle for lithography consisting essentially of a pellicle membrane and a pellicle frame, the pellicle membrane stretched on the pellicle frame comprises an amorphous perfluoropolymer and the terminal groups of the perfluoropolymer have been fluorinated.
Inventors:
SAKURAI IKUO
SHIRASAKI SUSUMU
KASHIDA SHU
SHIRASAKI SUSUMU
KASHIDA SHU
Application Number:
JP2000079953A
Publication Date:
September 28, 2001
Filing Date:
March 22, 2000
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
C08F8/20; C08F16/32; G03F1/62; (IPC1-7): G03F1/14; C08F8/20; C08F16/32
Attorney, Agent or Firm:
Ryoichi Yamamoto (3 others)