Title:
ペリクル、ペリクル付フォトマスク、露光方法、半導体の製造方法及び液晶ディスプレイの製造方法
Document Type and Number:
Japanese Patent JP7181496
Kind Code:
B2
Abstract:
Provided are an adhesive comprising substantially no surface modifier and leaving a less residue behind after a pellicle is separated; a pellicle; and a method of selecting an adhesive leaving a less residue behind. More specifically, provided are an adhesive for a pellicle having a ratio of a peel strength to a tensile strength of from 0.10 to 0.33; a pellicle comprising a pellicle frame, a pellicle film provided over an upper end face of the pellicle frame, and the adhesive adhered to a lower end face of the pellicle frame; and a method of selecting an adhesive, comprising the steps of: measuring a peel strength and a tensile strength of an adhesive, and selecting an adhesive having a ratio of the former to the latter of from 0.10 to 0.33 as the adhesive for a pellicle.
Inventors:
Yu Yanase
Atsushi Horikoshi
Atsushi Horikoshi
Application Number:
JP2017134609A
Publication Date:
December 01, 2022
Filing Date:
July 10, 2017
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C09J201/00; C09J133/00; C09J133/06; G03F1/62
Domestic Patent References:
| JP2004534904A | ||||
| JP2011107468A | ||||
| JP201790718A | ||||
| JP201790719A |
Attorney, Agent or Firm:
Mitsuo Matsui
Kawamura English
Kawamura English