PERIPHERAL PROJECTION ALIGNER

Japanese Patent JP3820946

B2

PROBLEM TO BE SOLVED: To provide a peripheral projection aligner for preventing a region that does not require exposure inside a wafer from being exposed even if the wafer with a notch is placed on a rotary stage in any direction.
SOLUTION: An exposure light irradiation section 2 is integrated with a wafer edge detection means 4 and a notch detection means 9. The wafer edge detection means 4 follows the edge of a wafer W for moving, and exposes the peripheral section of the edge of the wafer W by exposure light being irradiated from the exposure light irradiation section 2. In the start of exposure, even if the wafer edge detection means 4 detects the wafer edge, the exposure light is not immediately irradiated, and the exposure is started after the wafer W is rotated by a specified amount. Additionally, when the output signal of the notch detection means 9 changes during rotation, exposure is started from a preset exposure start position according to the changing state, the following operation of the wafer edge detection means 4 is stopped until the end position of the notch is reached when the irradiation region of the exposure light reaches the notch start position; and control is conducted so that the exposure is not made to a region that does not require exposure inside the wafer.

Yoshinori Nagai
Tochihara yuan

JP2001281292A

September 13, 2006

September 17, 2001

Click for automatic bibliography generation  

Ushio, Inc.

H01L21/027; G03F7/20; H01L21/68; (IPC1-7): H01L21/027; G03F7/20; H01L21/68

JP5217887A
JP6045226A
JP6275518A
JP9260263A
JP11162833A

Shunichiro Nagasawa

Previous Patent: IMAGE READER

Next Patent: LASER OUTPUT PART, AND DEVICE AND METHOD FOR ADJUSTING ITS OPTICAL AXIS