Title:
個人認証装置、個人認証方法および個人認証プログラム
Document Type and Number:
Japanese Patent JP7019765
Kind Code:
B2
Abstract:
To provide a personal authentication device that can prevent impersonation after authentication by quickly performing highly accurate authentication even during insertion with wearing of a single hands-free headset.SOLUTION: A personal authentication device 300 comprises: an acoustic signal observation unit 303 for, when detecting contact with a transmission path, which is a part of a head of an authentication subject, observing a first observation acoustic signal observed by transmitting an audible range to a part of the head and a second observation acoustic signal observed by transmitting an inaudible range with a higher frequency than that of the audible range to a part of the head; a storage unit for storing a first registration acoustic signal with an audible range of the authentication subject and a second registration acoustic signal with an inaudible range with a higher frequency than that of the first registration acoustic signal and not including the audible range; and an identification unit 304 for performing first authentication for authenticating the authentication subject by comparing the first observation acoustic signal and the first registration acoustic signal, and performing second authentication after succeeding in the first authentication by comparing the second observation acoustic signal and the second registration acoustic signal.SELECTED DRAWING: Figure 17
Inventors:
Kobunaka Takafumi
Takashi Osugi
Kohei Osugi
Takashi Osugi
Kohei Osugi
Application Number:
JP2020140388A
Publication Date:
February 15, 2022
Filing Date:
August 21, 2020
Export Citation:
Assignee:
NEC
NEC Platforms, Ltd.
NEC Platforms, Ltd.
International Classes:
G06F21/32
Domestic Patent References:
JP2005032056A | ||||
JP2004054496A |
Foreign References:
US20090087003 |
Attorney, Agent or Firm:
Desk
Keiji Kitajima
Keiji Kitajima
Previous Patent: AC rotary machine control device and electric vehicle
Next Patent: Fluid handling structure for lithography equipment
Next Patent: Fluid handling structure for lithography equipment