To provide a phase difference element that can reduce the reflection of incident light, and a manufacturing method for the same.
A phase difference element includes: a transparent substrate 11; an interface reflection prevention film 12 on the transparent substrate 11, in which a high-refractive-index film and a low-refractive-index film are alternately stacked and the thickness of each layer is less than or equal to the used wavelength; and an oblique deposition film 13 on the interface reflection prevention film 12, in which dielectric materials are alternately deposited obliquely in two directions that are different by 180°. The refractive index of the interface reflection prevention film 12 is higher than that of the transparent substrate 11 and lower than that of the oblique deposition film 13.
| JP7329952 | Base material for heat-resistant electronic devices |
| JP5458545 | Manufacturing method of optical articles |
| WO/2019/004045 | OPTICAL FILM |
SASAKI MASATOSHI
HANASHIMA NAOKI
TAKADA AKIO
YAMADA TAKATOSHI
| JP2006171328A | 2006-06-29 | |||
| JP2000047133A | 2000-02-18 | |||
| JP2005292646A | 2005-10-20 |
Seiji Iga
Toshiya Fujii
Nobuhiro Noguchi
Yusei Atsuya