Title:
PHENYL ALPHA-TRIFLUOROMETHYLACRYLATE COPOLYMER AND ITS PREPARATION
Document Type and Number:
Japanese Patent JPS6443512
Kind Code:
A
Abstract:
PURPOSE: To obtain the title copolymer contg. two different kinds of α- trifluoromethylacrylic acid derivative units and providing a resist material which is excellent in heat resistance and dry-etching resistance and has a high sensitivity and a high resolution.
CONSTITUTION: The title product is a copolymer contg. 1W99mol.% structural units of formula I (where R1 is CH3; R2 and R3 are each CH3 or C6H5) and 99W1mol.% structural units of formula II. It provides a resist material which is excellent in heat resistance and dry-etching resistance and has higher concentration and resolution. This resist material is applied to the surface of a semiconductor substrate by a known method and submitted to prebaking, irradiation and development.
Inventors:
TAMARU SHINJI
TAIRA KAZUO
MIZUGUCHI MORIO
HATADA KOICHI
MORI HARUHIKO
OKAMOTO YOSHIO
TAIRA KAZUO
MIZUGUCHI MORIO
HATADA KOICHI
MORI HARUHIKO
OKAMOTO YOSHIO
Application Number:
JP20053087A
Publication Date:
February 15, 1989
Filing Date:
August 10, 1987
Export Citation:
Assignee:
DAIKIN IND LTD
International Classes:
G03C1/00; C08F20/10; C08F220/24; G03F7/039; (IPC1-7): C08F220/24; G03C1/00; G03C1/72
Attorney, Agent or Firm:
Iwao Tamura