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Title:
PHOSPHOR-DISPERSED, RADIATION-SENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JPH09208611
Kind Code:
A
Abstract:

To obtain a phosphor-dispersed, radiation-sensitive compsn. which can offer a fluorescent screen having large film thickness and high display brightness by incorporating a phosphor, an org. polymer binder, a photocrosslinkable monomer, and a photoradical generator having a specified compsn.

A photoradical generator comprising a combination of a dimer (A) of 2,4,5-triarylimidazole (e.g. 2,2',4,4',5,5'-hexaphenylbiimidazole), an amino- contg. benzophenone photosensitizer (B) (e.g. 4,4'-diaminobenzophenone), and a thiol chain transfer agent (C) represented by the formula (wherein Z represents O, S, NH, or CONH) (e.g. 2-mercaptobenzothiazole) is prepd. The photoradical generator is then incorporated into a compsn. comprising a phosphor (e.g. Y2O3:Eu), an org. polymer binder (e.g. an acrylic resin), and a photocrosslinkable monomer (e.g. diacrylate of ethylene glycol) and/or an oligomer to obtain a phosphor-dispersed, radiation-sensitive compsn.


Inventors:
UDAGAWA TADAHIKO
MASUKO HIDEAKI
NEMOTO HIROAKI
BESSHO NOBUO
Application Number:
JP4217896A
Publication Date:
August 12, 1997
Filing Date:
February 06, 1996
Export Citation:
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Assignee:
JAPAN SYNTHETIC RUBBER CO LTD
International Classes:
C09K11/02; C08F2/38; C08F2/44; C08F2/50; G03F7/031; H01J11/36; H01J11/38; H01J11/42; H01J17/04; (IPC1-7): C08F2/50; C08F2/38; C08F2/44; C09K11/02; H01J17/04
Attorney, Agent or Firm:
Toshiaki Fukuzawa