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Title:
PHOTO-CURABLE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2022000489
Kind Code:
A
Abstract:
To provide a photo-curable resin composition having excellent durability to scratches and a very good anti-slip property.SOLUTION: A photo-curable resin composition comprises: a polyfunctional (meth)acrylate monomer (A) having 5 or more functional groups; a rosin-based resin (B); and a photopolymerization initiator (C). Preferably, the polyfunctional (meth)acrylate monomer (A) having 5 or more functional groups has a molecular weight of 300 to 3,000.SELECTED DRAWING: None

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Inventors:
KATO HIROSHI
Application Number:
JP2020105926A
Publication Date:
January 04, 2022
Filing Date:
June 19, 2020
Export Citation:
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Assignee:
AICA KOGYO CO LTD
International Classes:
C08L93/04; C08F2/44; C08F289/00; C08K5/103



 
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