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Title:
PHOTO-POLYMERIZABLE COMPOSITION
Document Type and Number:
Japanese Patent JPH06116313
Kind Code:
A
Abstract:

PURPOSE: To provide a photo-polymerizable composition having extremely high sensitivity to visible light, especially light having long wavelength and composed of a compound containing ethylenic double bond, a specific sensitizer and an activator capable of generating active radical under light irradiation in the presence of the sensitizer.

CONSTITUTION: The composition contains (A) a compound containing ethylenic unsaturated double bond [preferably (meth)acrylic acid ester], (B) a sensitizer of the formula (R1 is H or alkyl; R2 and R3 are H, alkyl, alkoxy, etc.; R4 is H, phenyl, etc.; Q is 2 to 5-nucleus condensed polycyclic aromatic hydrocarbon group, etc.; (m) is 0 or 1), e.g. a compound produced by the dehydrative condensation of the corresponding aromatic acetyl compound or a heteroaromatic acetyl compound and an aldehyde of a tetrahydroquinoline derivative in the presence of an acid or a base and (C) an activator capable of generating active radical under light irradiation in the presence of the component B, preferably a combination of a hexaaryl biimidazole and an organic thiol compound. The amounts of the components B and C are preferably 0.05-20 pts.wt. and 0.5-100 pts.wt. based on 100 pts.wt. of the component A, respectively.


Inventors:
URANO TOSHIYOSHI
NAGASAKA HIDEKI
TSUCHIYAMA MASAAKI
Application Number:
JP28881892A
Publication Date:
April 26, 1994
Filing Date:
October 27, 1992
Export Citation:
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Assignee:
MITSUBISHI CHEM IND
International Classes:
C08F2/50; G03F7/028; G03F7/038; (IPC1-7): C08F2/50; G03F7/028; G03F7/038
Attorney, Agent or Firm:
Hasegawa Moji