To provide a photosensitive resin composition capable of practically ensuring both high film leaving property and high sensitivity independently of the amount of a quinonediazido-containing photosensitive agent used, having low process dependence and capable of forming a good pattern.
In the photosensitive resin composition containing an alkali- soluble resin and a quinonediazido-containing photosensitive agent, the photosensitive agent comprises a mixture of two or more esterified products of tetrahydroxybenzophenone and 1,2-naphthoquinonediazidosulfonic acid different from each other is average esterification rate. The photosensitive agent is preferably a mixture of a photosensitive agent A comprising an esterified product of tetrahydroxybenzophenone and 1,2-naphtohquinonediazido-5-sulfonic acid having X% (50≤X≤100) average esterification rate and a photosensitive agent B comprising a similar esterified product having Y% (25≤Y≤(X-10)) average esterification rate and the mixing ratio of A:B is preferably (10-90):(90-10).
IKEMOTO JUN
SHIODA HIDEKAZU
KAWATO SHUNJI
Next Patent: PHOTOSENSITIVE RESIN COMPOSITION AND PRINTED WIRING BOARD USING THE SAME