Title:
PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2022161843
Kind Code:
A
Abstract:
To provide: a novel photoacid generator comprising a sulfonyl imide salt compound that has high photosensitivity to i-line and also has excellent storage stability in a blend with a cationic polymerizable compound such as an epoxy compound; and an energy ray-curable composition, a chemically amplified positive photoresist composition and a chemically amplified negative photoresist composition, each containing the photoacid generator.SOLUTION: A photoacid generator comprises a sulfonyl imide salt compound represented by the following general formula (1). (In formula (1), X+ is a sulfonium cation represented by the following general formula (2), (20) or (21)).SELECTED DRAWING: None
Inventors:
FUKUNAGA NORIYA
KIZU TOMOHITO
KIZU TOMOHITO
Application Number:
JP2022051467A
Publication Date:
October 21, 2022
Filing Date:
March 28, 2022
Export Citation:
Assignee:
SAN APRO KK
International Classes:
G03F7/004; C07C381/12; C08F220/18; C09K3/00; G03F7/038; G03F7/039
Attorney, Agent or Firm:
Hiroshi Hayashi