Title:
PHOTOACID GENERATOR, PHOTORESIST COMPOSITION AND PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2022105281
Kind Code:
A
Abstract:
To provide: a photoacid generator; a photoresist composition; and a pattern formation method.SOLUTION: A photoacid generator includes the part of the formula (1), where, Ar1 is a substituted or unsubstituted aryl group; R1 is an alkyl or aryl group which may be substituted or unsubstituted; Ar1 and R1 arbitrarily and selectively bond each other by a single bond or a divalent coupling group to form a ring; Y is a single bond or a divalent group; and*is a coupling point of a part to different atoms of the photoacid generator. The compound of the photoacid generator can find specific applications in a photoresist composition used for forming a lithography pattern for forming an electronic device.SELECTED DRAWING: None
Inventors:
EMAD AQAD
Application Number:
JP2021205348A
Publication Date:
July 13, 2022
Filing Date:
December 17, 2021
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/004; C07C309/12; C07C317/04; C07C381/12; C07D333/76; C09K3/00; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013116885A | 2013-06-13 | |||
| JP2014040387A | 2014-03-06 | |||
| JP2015091935A | 2015-05-14 |
Foreign References:
| CN104570602A | 2015-04-29 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office