Title:
PHOTOACID GENERATOR AND PHOTORESIST COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2013079232
Kind Code:
A
Abstract:
To provide a photoacid generator that contains tailor-made photoacid generators having greater diffusion control and attendant properties such as resist profile.
A photoacid generator compound has the formula (I): [A-(CHR1)p]k-(L)-(CH2)m-(C(R2)2)n-SO3-Z+ (wherein: A is (un)substituted monocyclic, polycyclic, or fused polycyclic cycloaliphatic group; R1 is H, a single bond, or a substituted or unsubstituted 1-30C alkyl group; R2 is independently H, F, or 1-4C fluoroalkyl; L is a linking group comprising a sulfonate group, a sulfonamide group, or a 1-30C sulfonate or sulfonamide-containing group; Z is an organic or inorganic cation; p is an integer of 0 to 10; k is 1 or 2; m is an integer of 0 or greater; and n is an integer of 1 or greater).
Inventors:
AQAD EMAD
XU CHENG-BAI
LI MINGQI
YAMADA SHINTARO
WILLIAMS III WILLIAM
XU CHENG-BAI
LI MINGQI
YAMADA SHINTARO
WILLIAMS III WILLIAM
Application Number:
JP2012210465A
Publication Date:
May 02, 2013
Filing Date:
September 25, 2012
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C07C309/65; C07C311/04; C07C381/12; C07D313/10; C07D327/04; C07D493/18; C07D497/20; C08F2/50; C09K3/00
Domestic Patent References:
| JP2006162735A | 2006-06-22 | |||
| JP2002162722A | 2002-06-07 | |||
| JP2007145803A | 2007-06-14 | |||
| JP2007206639A | 2007-08-16 | |||
| JP2007086166A | 2007-04-05 | |||
| JP2010275296A | 2010-12-09 | |||
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Foreign References:
| WO2011104127A1 | 2011-09-01 | |||
| CN101987880A | 2011-03-23 | |||
| WO2008153100A1 | 2008-12-18 | |||
| WO2008153110A1 | 2008-12-18 | |||
| WO2009110388A1 | 2009-09-11 | |||
| WO2010237334A1 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office