Title:
PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2016147879
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide photoacid generator compounds employing new photoresists that can provide highly resolved images of submicron dimensions.SOLUTION: There is provided a compound of the formula in the figure that comprise: 1) a SOmoiety; 2) one or more fluorinated carbons; and 3) one or more fluorinated carbons either directly or indirectly substituted with an ester keto group.SELECTED DRAWING: None
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Inventors:
AQAD EMAD
LI MINGQI
CHENG BAI SU
LI MINGQI
CHENG BAI SU
Application Number:
JP2016045668A
Publication Date:
August 18, 2016
Filing Date:
March 09, 2016
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C07D307/93; C07C381/12; C07D327/04; C07D493/18; C07D497/18; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2009186952A | 2009-08-20 | |||
| JP2010033032A | 2010-02-12 | |||
| JP2009258695A | 2009-11-05 | |||
| JP2006306856A | 2006-11-09 | |||
| JP2008268744A | 2008-11-06 | |||
| JP2006257078A | 2006-09-28 | |||
| JP2011173863A | 2011-09-08 | |||
| JP5723626B2 | 2015-05-27 | |||
| JP2011090284A | 2011-05-06 |
Foreign References:
| EP2060600A1 | 2009-05-20 | |||
| US20100015552A1 | 2010-01-21 | |||
| EP2267532A1 | 2010-12-29 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office