Title:
PHOTOCURABLE COMPOSITION
Document Type and Number:
Japanese Patent JPH04175314
Kind Code:
A
Abstract:
PURPOSE:To obtain a photocurable composition which can give a cured product excellent in internal homogeneity, accuracy of surface transfer, an ability to cut ultraviolet rays, transparency and hue by adding a photopolymerization initiator and a specified ultraviolet absorber to a specified sulfur-containing monomer. CONSTITUTION:A photocurable composition comprising 100 pts.wt. monomer based on a sulfur-containing monomer (A) of formula I, 0.01-0.2 pt.wt. photopolymerization initiator (B) comprising at least one compound of formula II and 0.01-0.2 pt.wt. at least one ultraviolet absorber (C) selected among those based on benzophenone and benzotriazole. In the formulas, R<1> is H or methyl; R<2> is 1-6 C alkylene; Ar is 6-30 C arylene, aralkylene or the like; X is -O- or -S-; Y is -S- or -SO2 when X is -O-, and -S- or -SO2-, -CO- or the like when X is-S-; m and n are each 1-5; p is 0-10; Q is methyl, methoxy or Cl; K is 2 or 3; and R is phenyl or methoxy.
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Inventors:
WATARI FUMIE
HAYAKAWA SEIICHIRO
ISAKA TSUTOMU
HAYAKAWA SEIICHIRO
ISAKA TSUTOMU
Application Number:
JP30264090A
Publication Date:
June 23, 1992
Filing Date:
November 09, 1990
Export Citation:
Assignee:
MITSUBISHI PETROCHEMICAL CO
International Classes:
G02B1/04; C08F2/48; C08F20/10; C08F20/38; C08F290/00; C08F299/02; (IPC1-7): C08F2/48; C08F20/38; C08F299/02; G02B1/04
Attorney, Agent or Firm:
Hideo Watanabe