Title:
PHOTOCURABLE RESIN COMPOSITION, VINYL GROUP-CONTAINING RESIN AND PROCESS FOR PRODUCING VINYL GROUP-CONTAINING RESIN
Document Type and Number:
Japanese Patent JP2011074125
Kind Code:
A
Abstract:
To provide a highly sensitive photocurable resin composition excellent not only in thermal shock resistance but also in electrical insulation properties, a vinyl group-containing resin used in the composition and a process for producing the vinyl group-containing resin.
The photocurable resin composition includes a vinyl group-containing resin (A), a polymerizable compound (B), and a photopolymerization initiator (C), and has a hydrolyzable chlorine content of ≤100 ppm. The vinyl group-containing resin (A) is a vinyl group-containing resin represented by at least one formula selected from the group consisting of formulae (A1), (A2), and (A3).
Inventors:
ISHIKAWA HIROYUKI
ARIOKA DAISUKE
HAYASHI TOSHIAKI
SASAKI HIROKI
ARIOKA DAISUKE
HAYASHI TOSHIAKI
SASAKI HIROKI
Application Number:
JP2009224472A
Publication Date:
April 14, 2011
Filing Date:
September 29, 2009
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
C08F290/00; C08F220/30; C08F291/02; G03F7/038
Attorney, Agent or Firm:
Koichi Hirota
Yoshihiro Nagare
Naoko Matsuda
Hiroshi Ikeda
Yoshihiro Nagare
Naoko Matsuda
Hiroshi Ikeda
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