Title:
PHOTOCURABLE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2011042711
Kind Code:
A
Abstract:
To provide a photocurable resin composition which has reduced hygroscopicity and can improve the cold-heat-cycle resistance of a cured product thereof without deteriorating the migration resistance properties thereof when the cured product is used in a printed wiring board or the like.
The photocurable resin composition comprises a carboxylic acid-containing resin, a photopolymerization initiator, an epoxidated polybutadiene compound, and a maleimide compound.
Inventors:
MINEGISHI MASASHI
ARIMA MASAO
ARIMA MASAO
Application Number:
JP2009190197A
Publication Date:
March 03, 2011
Filing Date:
August 19, 2009
Export Citation:
Assignee:
TAIYO HOLDINGS CO LTD
International Classes:
C08G59/42; C08J7/04; G03F7/004; G03F7/028; G03F7/033
Domestic Patent References:
JP2008299294A | 2008-12-11 | |||
JP2008287227A | 2008-11-27 | |||
JP2001305726A | 2001-11-02 |
Foreign References:
WO2006008995A1 | 2006-01-26 | |||
WO2000002091A1 | 2000-01-13 |
Attorney, Agent or Firm:
Amagi International Patent Office
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