Title:
PHOTOCURABLE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPH03223318
Kind Code:
A
Abstract:
PURPOSE:To obtain the title composition which can give a photosensitive coating film which is substantially tack-free and has sufficient hardness by mixing a specified modified resin with a grafted inorganic powder and a photopolymerization initiator. CONSTITUTION:An addition reaction between a conjugated diene (co)polymer of a number-average mol.wt. of 500-5000 and a vinyl content of 50mol% or more and an alpha,beta-unsaturated carboxylic acid anhydride is effected to obtain an adduct (a) having acid anhydride groups and a softening point (ring and ball softening point test, JIS K 2531-60) of 70-200 deg.C. Component (a) is subjected to a reaction with an alcoholic hydroxyl-containing alpha,beta-unsaturated monocarboxylic ester (b) of the formula (wherein R1 and R2 are each H, or CH3; and R3 is a 2C or higher hydrocarbon residue which may contain a heteroatom) to obtain a modified resin (A) in which 10mol% of the acid anhydride groups of component (a) are opened. 100 pts.wt. component A is mixed with 3-50 pts.wt. grafted inorganic powder (B) obtained by grafting (un)saturated (un)substituted hydrocarbon residues onto an inorganic powder of a particle size of 0.1mum or less (wherein the total number of carbon atoms in the graft hydrocarbon residues per inorganic atom is 4 or more) and 0.1-20 pts.wt. photopolymerization initiator (C).
Inventors:
NARAHARA HISAO
SHIRATORI FUMIO
YAMAGUCHI TATSUO
OMIKA HIROYOSHI
SHIRATORI FUMIO
YAMAGUCHI TATSUO
OMIKA HIROYOSHI
Application Number:
JP1797190A
Publication Date:
October 02, 1991
Filing Date:
January 30, 1990
Export Citation:
Assignee:
NIPPON PETROCHEMICALS CO LTD
International Classes:
C08K7/18; C08F2/48; C08F279/00; C08F279/02; C08F290/00; C08F299/00; C08K7/16; C08K9/04; C09D5/00; C09D5/44; (IPC1-7): C08F2/48; C08F279/02; C08F299/00; C08K7/18; C08K9/04; C09D5/00; C09D5/44
Attorney, Agent or Firm:
Tatsuo Ito (1 outside)