Title:
PHOTOGRAPHIC PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JPS5299812
Kind Code:
A
Abstract:
PURPOSE: To provide a photographic photosensitive material, in which there is provided on emulsion mask a protective layer which can be mechanically peeled off to remove glass chips in high quality photomask especially for IC and to prevent the surface from adhesion of dust at the time of image exposure.
Inventors:
SATOU MASATOSHI
FUJII ITSUO
FUJII ITSUO
Application Number:
JP1630176A
Publication Date:
August 22, 1977
Filing Date:
February 16, 1976
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03C1/76; (IPC1-7): G03C1/00