PHOTOMASK BLANK, GLASS SUBSTRATE FOR PHOTOMASK BLANK AND PHOTOMASK

Title:

PHOTOMASK BLANK, GLASS SUBSTRATE FOR PHOTOMASK BLANK AND PHOTOMASK

Document Type and Number:

Japanese Patent JP3527909

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a photomask blank and a glass substrate for photomask blank capable of producing a photomask having high pattern precision, and the photomask.
SOLUTION: The uneven cross-sectional shape of a main surface 1 of the photomask blank is formed to be a plane nearly parallel to a reference plane 2 which is nearly parallel to the main surface or a curved surface which is simply projected or recessed.

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Inventors:

Asada, Masayuki

Application Number:

JP2003135912A

Publication Date:

May 17, 2004

Filing Date:

February 28, 1992

Export Citation:

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Assignee:

HOYA CORP

International Classes:

G03F1/50; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; H01L21/027

Attorney, Agent or Firm:

阿仁屋節雄（外２名）

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