Title:
PHOTOMASK BLANK AND PHOTOMASK
Document Type and Number:
Japanese Patent JP2010237277
Kind Code:
A
Abstract:
To provide a photomask blank which has high sensitivity and is superior in storage stability and safelight aptitude, and a photomask which has high resolution and is superior in linearity of image edge parts.
The photomask blank has, on a substrate, a photosensitive composition layer containing a sensitizing dye (A) expressed by general formula (I), a polymerization initiator (B), an ethylenically unsaturated compound (C), a binder polymer (D), and a light shielding material (E). In general formula (I): X1and X2each independently represent an oxygen atom, a sulfur atom, -CR11R12-, or -NR13-, wherein at least one of X1and X2is an oxygen atom, a sulfur atom, or -NR13-; Y represents an oxygen atom, a sulfur atom, or =NR14; R1to R14each independently represent a hydrogen atom or a monovalent non-metallic atomic group and may be coupled to each other to form an aliphatic or aromatic ring.
COPYRIGHT: (C)2011,JPO&INPIT
Inventors:
AOSHIMA TOSHIE
Application Number:
JP2009082537A
Publication Date:
October 21, 2010
Filing Date:
March 30, 2009
International Classes:
C07D209/14; C07D327/04; C09B23/00; G03F1/50; G03F1/56; G03F7/004; G03F7/029; G03F7/031; H01L21/027
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
