フォトマスク欠陥解析装置および欠陥解析方法

Title:

フォトマスク欠陥解析装置および欠陥解析方法

Document Type and Number:

Japanese Patent JP3750270

Kind Code:

B2

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Inventors:

Yuichi Fukushima

Application Number:

JP10369097A

Publication Date:

March 01, 2006

Filing Date:

April 21, 1997

Export Citation:

Assignee:

Toppan Printing Co., Ltd.

International Classes:

G03F1/84; H01L21/027; H01L21/66

Domestic Patent References:

Attorney, Agent or Firm:

Masatake Shiga
Takashi Watanabe
Shigeo Naruse

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