PURPOSE: To provide the photomask which has an area, wherein the distribution state of light transmissivity varies continuously or in fine steps, in an optional shape, the manufacture which mass-produces the photomask with efficiency, and the exposure device which performs an exposure process wherein light intensity is delicately controlled through single exposing operation.
CONSTITUTION: The photomask 1 having a vapor-deposited layer 12 which is made of a control material for light transmissivity and varies in the thickness of its convex shape and a mask which has an aperture are arranged on a transparent base material 11 so that a gap is left; and the control material for the light transmissivity is vapor-deposited from the mask side to manufacture the photomask.
Fujio Yasuo
Kazutaka Hara
Yamamoto Hide
