Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOMASK AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2006047564
Kind Code:
A
Abstract:

To provide a photomask having an alignment mark for a photomask where a scanning track by an electron beam does not remain as a defect in a phase shift mask comprising a multilayer film which requires a plurality of times of exposure steps, and to provide a method for manufacturing the photomask.

The phase shift mask is formed by scanning an alignment groove with an electron beam, the groove patterned in a halftone film by using an alignment mark for a photomask, and then patterning a light shielding film by exposure to an electron beam to remove the scanning track.


More Like This:
JP2023108276MASK BLANK, MASK FOR TRANSFER, METHOD FOR PRODUCING MASK FOR TRANSFER AND METHOD FOR PRODUCING DISPLAY DEVICE
JPH05297566PRODUCTION OF MASK FOR EXPOSING
JP2837063PROBLEM TO BE SOLVED: To form a resist pattern.
Inventors:
YASUI TAKASHI
Application Number:
JP2004226852A
Publication Date:
February 16, 2006
Filing Date:
August 03, 2004
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
G03F1/32; G03F1/42; H01L21/027
Attorney, Agent or Firm:
Fumio Iwahashi
Hiroki Naito
Daisuke Nagano



 
Previous Patent: METHOD FOR MANUFACTURING SUBSTRATE WITH RECESSED PORTION FOR MICROLENS, AND TRANSMISSIVE SCREEN

Next Patent: ADVERTISEMENT DISPLAY METHOD, CELLULAR PHONE TERMINAL, AND ADVERTISEMENT DISTRIBUTION SERVER