PURPOSE: To provide a method for manufacturing a reusable isometric photomask for a semispherical substrate having double contours such as a radome or a three-dimensinal(3D) printed circuit board.
CONSTITUTION: At first, a light shielding material 12 is stuck to a shell body 14, i.e., a tool, corresponding to the shape of a radome or a printed circuit board. Then a pattern is formed on the material 12 and the part of the material 12 corresponding to the pattern is removed. A light shielding material pattern obtained by pattern removal coincides with a pattern to be formed on a 3D printed circuit board or a radome. Then a light transmitting layer 13 is stuck to the layer 12 to support the layer 12. These light shielding and transmitting materials include a reusable isometric photomask 9 to be removed from the shell body 14. The photomask 9 is used for forming an image of a required pattern on the circuit board or the radome.
JIYON UORUBOORUDO
JIEEMUZU II FUOOMAN
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