To finish exposure with one mask in an exposure to produce a fine dark line image using a photomask.
The photomask has a pair of light transmitting opening patterns 4 laid in parallel with each other in a substantially identical line width interposing a linear center light shielding portion 5, and a semi-transmitting region laid to interpose the pair of light transmitting opening patterns 4 in both sides in the width direction. The semi-transmitting region is a common-phase semi-transmitting portion 2 having a property of giving the same phase in the transmitting light as the phase of the light transmitting the light transmitting opening pattern 4. The semi-transmitting region is composed of patterns laid in a pitch as fine as not to be resolved by irradiation with light.
Toshio Morita
Yoshihei Nakamura
Yutaka Horii
Hisato Noda
Masayuki Sakai
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