To provide a photomask in which a vertical step in a minute optical element can be formed by relieving diffraction-interference intensity occurring at light transmitting part and shading part sides at a boundary part at which transmittance changes in the light transmitting part and the shading part of the photomask, and to provide a mold for manufacturing the minute optical element manufactured by using the photomask, the minute optical element, an optical system having the minute optical element, an optical instrument, an exposure device, and a method for manufacturing a device.

This photomask is configured which is provided with at least one row of an intermediate layer for giving transmittance change less than a transmittance difference between the light transmitting part and the shading part to the boundary between the light transmitting part and the shading part with a width equal to or less than resolution limit.