PURPOSE: To provide a photomask which is composed of only the chromium and one layer of phase shifter by partially controlling the transmittance of a reticle, is easy manufacture and is low in cost and a pattern forming method using the photomask.
CONSTITUTION: The required pattern parts of the photomask having the phase shift patterns and the light shielding patterns is provided with chromium patterns 24 formed at a fine repeating pitch to lower the light intensity of the necessary pattern parts on a wafer at the time of forming the mask patterns for line and spaces of a positive type resist by a projection aligning method. As a result, the transfer of unnecessary shifter edges is eliminated by applying a desired exposure to the required pattern parts.
KAWAZU YOSHIYUKI
YAMASHITA YOSHIO
