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Patent Searching and Data


Title:
PHOTOMASK
Document Type and Number:
Japanese Patent JPS6371853
Kind Code:
A
Abstract:

PURPOSE: To facilitate the replacement of a pericle film and to eliminate soil due to an adhesive by permitting the magnetic force of a magnetic part provided around a circuit pattern in a photomask main body to maintain the frame of the pericle film.

CONSTITUTION: The magnetic part (reticle part) 4 is provided around the circuit pattern 3 in the photomask main body 1. The magnetic force of the magnetic part 4 maintains the pericle frame 5 to which the pericle film (transparent film) 6 covering the circuit pattern 3 is expanded. Unlike a conventional method that a frame is stuck with an adhesive tape, the replacement of the new pellicle film 6 is facilitated. Besides to that, the soil of the circuit pattern 3, which the adhesive causes, can be prevented.


Inventors:
KONO TOSHIHIKO
Application Number:
JP21578286A
Publication Date:
April 01, 1988
Filing Date:
September 16, 1986
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G03F1/00; G03F1/64; H01L21/027; (IPC1-7): H01L21/30
Attorney, Agent or Firm:
Katsuo Ogawa