Title:
光電子増倍管
Document Type and Number:
Japanese Patent JP4230606
Kind Code:
B2
Abstract:
In a photomultiplier tube 1, an etching technique is used to form electron multiplying holes 8a in plate-shaped dynodes 8 that are stacked in multiple layers. To perform this etching process, a pattern frame 22 is disposed around a plate-shaped dynode substrate 20. A bridge portion 23 is provided for connecting the pattern frame 22 to an edges 20a of the dynode substrate 20. The dynode substrate 20 is masked, and the etching process is performed to form a plurality of electron multiplying holes 8a in the dynode substrate 20. Subsequently, the bridge portion 23 is cut near the dynode substrate 20, leaving a small bridge remainder 8c on the edge 8b of the dynode 8. In order to suppress noise generated by these bridge remainders, the bridge remainders 8c on neighboring dynodes 8 are arranged in positions such that straight lines parallel to the dynode stacking direction and passing through the bridge remainder 8c do not overlap each other, thereby further improving the basic characteristics of the photomultiplier tube 1.
Inventors:
Hiroyuki Hisashima
Hideki Shimoi
Hideki Shimoi
Application Number:
JP11638199A
Publication Date:
February 25, 2009
Filing Date:
April 23, 1999
Export Citation:
Assignee:
Hamamatsu Photonics Co., Ltd.
International Classes:
H01J43/20; H01J43/22
Domestic Patent References:
| JP113677A |
Foreign References:
| EP0686996A1 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Tatsuya Shioda
Shiro Terasaki
Tatsuya Shioda
Shiro Terasaki