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Patent Searching and Data


Title:
PHOTOMULTIPLIER
Document Type and Number:
Japanese Patent JP2009200044
Kind Code:
A
Abstract:

To significantly improve response time characteristics by a structure enabling mass production.

A dynode unit (DY1) at a second stage from a photocathode (200) supports a first dynode receiving photoelectrons from the photocathode (200), a first-stage dynode unit (DY2) supports a second dynode receiving secondary electrons from the first dynode. Further, a dynode pin (430), as an electron multiplier section (400) is viewed from a photocathode (200) side, is retained within an effective region (AR1) of the electron multiplier section (400) contributing to secondary electron multiplication. With this structure, a focusing distance (D) from the photocathode (200) to the first-stage dynode unit (DY2) is shortened and the effective region (AR1) is enlarged to effectively reduce variations in transit time of photoelectrons propagating from the photocathode (200) to the first-stage dynode unit (DY2).


Inventors:
OMURA TAKAYUKI
KUSHIMA HIROYUKI
SHIMOI HIDEKI
KODAMA TSUYOSHI
Application Number:
JP2009029791A
Publication Date:
September 03, 2009
Filing Date:
February 12, 2009
Export Citation:
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Assignee:
HAMAMATSU PHOTONICS KK
International Classes:
H01J43/06; H01J43/20
Attorney, Agent or Firm:
Yoshiki Hasegawa
Shiro Terasaki
Satoru Ishida