Title:
PHOTOPOLYMERIZABLE COMPOSITION
Document Type and Number:
Japanese Patent JP3220498
Kind Code:
B2
Abstract:
PURPOSE: To obtain the title composition improved in the sensitivity to light in the longer wavelength region, development latitude, etc., by adding a specified photopolymerization initiator to a photopolymerizable composition comprising a radical-polymerizable compound, a photopolymerization initiator and an organic polymer compound.
CONSTITUTION: A radical-polymerizable compound containing at least two ethylenic unsaturations in the molecule (e.g. ethylene glycol diacrylate) is mixed with a photopolymerization initiator (e.g. 2-mercaptobenzimidazole), an organic polymer compound (e.g. 2-hydroxyethyl methacrylate/acrylonitrile copolymer) and a substituted ethylene compound of formula I or II (wherein n is 1-6) (e.g. a compound of formula III) to produce a photopolymerizable composition. This composition is highly sensitive to light in an extensive region from ultraviolet light to visible light, and is highly sensitive even to, e.g. argon laser beams.
Inventors:
Hiroaki Okamoto
Application Number:
JP4918592A
Publication Date:
October 22, 2001
Filing Date:
March 06, 1992
Export Citation:
Assignee:
Okamoto Chemical Co., Ltd.
International Classes:
C08F2/50; C08F2/46; C08F26/06; G03F7/027; G03F7/028; G03F7/031; G03F7/032; (IPC1-7): C08F2/46
Domestic Patent References:
| JP235454A |
Attorney, Agent or Firm:
Okuyama Shoichi (5 people outside)