To obtain a compsn. having ultrahigh sensitivity and capable of exposure with Ar laser light and SHG type YAG laser light by using a trihalomethyltriazine compd. and a titanocene compd. as a photopolymn. initiator and a specified dinitrile compd. as a sensitizer.
A film forming component, a photopolymn. initiator and a sensitizer are incorporated, a trihalomethyltriazine compd. and a titanocene compd. are used as the photopolymn. initiator and a dinitrile compd. represented by the formula is used as the sensitizer. In the formula, X is -O-, -S- or >NH, each of R1 and R2 is H, halogen, nitro, 1-6C (alkyl, acyl, alkoxy, etc.), 1-4C alkyl substd. dialkylamino, etc., and each of R3 and R4 is H, halogen, nitro, 1-6C (alkyl, acyl, alkoxy, etc.), 1-4C alkyl substd. dialkylamino, etc.
OKUI TOSHIKI
KOMANO HIROSHI
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