To provide a photopolymerizable composition high in sensitivity and restrained from occurrence of development sludge by utilizing a specified amino acid compound.
This photopolymerizable composition comprises a compound having an ethylenically unsaturated bond and the amino acid compound represented by the formula in which (n) is an integer of 1-8; each of R1-R4 is, independently, an H atom or a monovalent organic group, and each of plural R3 and each of plural R4 may be same or different and R1 and R2 may combine with each other to form a ring; and M is an H atom or a monovalent organic group or a cation. Addition of the amino acid compound of the formula permits the composition to be high in sensitivity and the photosensitive material using this composition to be improved in the solubility of the unexposed parts in a developing solution and restrained from occurrence of development sludge.
KUNIDA KAZUTO
SORORI TADAHIRO
