PHOTORESIST COMPOSITION CONTAINING CYCLIC OLEFIN POLYMER AND ADDITIVE

Japanese Patent JP3418971

B2

PROBLEM TO BE SOLVED: To obtain a photoresist composition using an acid as a catalyst, capable of forming an image with radiation of 193 nm and capable of forming a photoresist structure having high resolution and high etching resistance by development.
SOLUTION: The photoresist composition comprises a combination of a cyclic olefin polymer, a photosensitive acid-generating agent and a substantially transparent bulky hydrophobic additive. The cyclic olefin polymer contains a cyclic olefin unit having a polar functional group which promotes dissolution in an aqueous alkali solution and the cyclic olefin unit having an acid-labile group which inhibits the dissolution in the aqueous alkali solution. The hydrophobic additive is selected from the group comprising a saturated steroid compound, a non-steroid cycloaliphatic compound and a non-steroid polycycloaliphatic compound having an acid-labile bond.

Pushkar Lao Vranasi
Robert Dee Allen
Thomas I Worrow
Julian Opitz
Richard A. de Pietro
Margaret Sea Lawson
Anne-Marie Muharter
Joseph F. Maniscarco
Mahmoud M. Hogyste
George M. Jordamo
Hiroshi Ito

JP2000065165A

June 23, 2003

March 09, 2000

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INTERNATIONAL BUSINESS MASCHINES CORPORATION

C08F232/00; C08K5/00; C08L45/00; G03F7/004; G03F7/039; G03F7/11; G03F7/38; G03F7/40; H01L21/027; (IPC1-7): G03F7/039; G03F7/004; H01L21/027

JP10307401A
JP10111569A
JP815865A
JP6123970A
JP5265214A
JP9265177A

Hiroshi Sakaguchi (1 person outside)

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