Title:
深紫外線リソグラフィー用のフォトレジスト組成物
Document Type and Number:
Japanese Patent JP2004530159
Kind Code:
A
Abstract:
The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region and a method of processing the novel photoresist, where the photoresist comprises a novel copolymer, a photoactive component, and a solvent. The novel copolymer comprises a unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and a unit derived from an unsaturated cyclic non aromatic compound.
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Inventors:
Dummel Ralph Earl
Sakamuri Rye
Sakamuri Rye
Application Number:
JP2002589881A
Publication Date:
September 30, 2004
Filing Date:
April 25, 2002
Export Citation:
Assignee:
Clariant International Limited
International Classes:
C08F220/42; C08F232/00; G03F7/038; G03F7/039; H01L21/027; (IPC1-7): G03F7/039; C08F220/42; C08F232/00; H01L21/027
Attorney, Agent or Firm:
Mitsufumi Esaki
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith