Title:
深紫外線リソグラフィ用のフォトレジスト組成物
Document Type and Number:
Japanese Patent JP2006518476
Kind Code:
A
Abstract:
The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process for imaging the photoresist composition of the present invention, and to a process of making the polymer in the presence of an organic base.
Inventors:
Dummel Ralph Earl
Sakamuri Ray
Houlihan Francis M
Sakamuri Ray
Houlihan Francis M
Application Number:
JP2006501786A
Publication Date:
August 10, 2006
Filing Date:
February 10, 2004
Export Citation:
Assignee:
AZ Electronic Materials USA Corporation
International Classes:
G03F7/039; C08F8/00; C08F32/00; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Mitsufumi Esaki
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith