フォトレジスト組成物とその工業製品 - National Institute of Advanced Industrial Science and Technology

Title:

フォトレジスト組成物とその工業製品

Document Type and Number:

Japanese Patent JP4486744

Kind Code:

B2

More Like This:

JPS6311932	SELF-DEVELOPING RADIATION RESIST
JPS62255934	NEGATIVE TYPE PHOTORESIST COMPOSITION
JP2923348	[Title of the Invention] A photocurable coloring composition

Inventors:

Kawabe Honest
Masahide Murata
Toshio Kase
Hiroyuki Ozaki
Yoshifumi Fukui
Juante Van
Jinjiju
Satoshi Miyazawa
Hideaki Hagiwara
Kenji Tsuchihara
Suzuki Yasuzo
Asai Michihiko

Application Number:

JP2000340354A

Publication Date:

June 23, 2010

Filing Date:

November 08, 2000

Export Citation:

Click for automatic bibliography generation Help

Assignee:

National Institute of Advanced Industrial Science and Technology
Nippon Steel Chemical Co., Ltd.

International Classes:

G03F7/012; G03F7/033; C08K5/28; C08K5/34; C08K5/41; C08L25/18; C09D125/18; G03F7/008; H01L21/027

Domestic Patent References:

JP3096951A
JP5310834A
JP5107753A
JP2001294619A

Attorney, Agent or Firm:

Eisuke Fujimoto
Masayoshi Kanda
Akio Miyao

Previous Patent: 血管内壁の付着物質の分析システム

Next Patent: ラスタ出力式走査（ＲＯＳ）システム